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1 deep-UV lithography
Микроэлектроника: фотолитография на глубоком ультрафиолете, фотолитография на жёстком ультрафиолете -
2 deep-uv lithography
Микроэлектроника: фотолитография на глубоком ультрафиолете, фотолитография на жёстком ультрафиолете -
3 deep-UV lithography
фотолітографія з використанням дальнього ультрафіолетового [УФ-] випромінювання, літографія в глибокому ультрафіолетіEnglish-Ukrainian dictionary of microelectronics > deep-UV lithography
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4 deep-UV lithography
English-Russian dictionary of microelectronics > deep-UV lithography
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5 deep-uv lithography
English-Russian dictionary of microelectronics > deep-uv lithography
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6 deep-uv lithography
English-Russian big polytechnic dictionary > deep-uv lithography
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7 lithography
(мікро) літографія. Процес перенесення малюнка на поверхню пластини за допомогою світлового випромінювання (photolithography), потоку електронів або рентгенівського випромінювання (X-ray lithography) - charged-particle lithography
- contact lithography
- contactless lithography
- contrast-enhanced lithography
- deep-UV lithography
- direct growth lithography
- direct-write electron-beam lithography
- dot lithography
- dual-surface lithography
- electron-beam lithography
- electron lithography
- excimer laser lithography
- fine-line lithography
- focused ion-beam lithography
- full-wafer lithography
- bard-contact lithography
- high-resolution lithography
- high-voltage EB lithography
- holographic lithography
- hybrid lithography
- i-line lithography
- ion-beam lithography
- laser-basedlithography
- laserlithography
- lift-off lithography
- mask lithography
- maskless lithography
- micrometer micron lithography
- micron lithography
- molecular-level lithography
- optical lithography
- positive-resist projection lithography
- precise registration lithography
- projection lithography
- proximity lithography
- raster-scan electron-beam lithography
- resistless lithography
- scaled-down lithography
- scanning electron-beam lithography
- scanning ion-beam lithography
- self-aligned dual-surface lithography
- soft lithography
- soft-contact lithography
- step-and-repeat lithography
- step-on-wafer lithography
- stepper lithography
- submicron lithography
- synchrotron-radiationlithography
- synchrotronlithography
- ultraviolet lithography
- vector-scan electron-beam lithography
- wafer lithography
- wafer-stepper lithography
- write e-beam lithography
- X-ray lithographyEnglish-Ukrainian dictionary of microelectronics > lithography
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8 lithography
1. литография2. фотолитография3. плоская печать; офсетная печать4. продукция плоской или офсетной печатиphoto-offset lithography — офсетная печать с форм, изготовленных фотомеханическим способом
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9 system
1) система || системный3) вчт операционная система; программа-супервизор5) вчт большая программа6) метод; способ; алгоритм•system halted — "система остановлена" ( экранное сообщение об остановке компьютера при наличии серьёзной ошибки)
- CPsystem- H-system- h-system- hydrogen-air/lead battery hybrid system- Ksystem- Lsystem- L*a*b* system- master/slave computer system- p-system- y-system- Δ-system -
10 offset
1. n сад. побег, отводок2. n отпрыск, потомок3. n начало, отправление; старт4. n ответвление; отвод или изгиб5. n возмещение, компенсация6. n встречное требование7. n стр. архит. берма; уступ; выступ8. n геол. отрог горного кряжа9. n полигр. офсет, офсетный способ печати10. n полигр. офсет, оттиск или отпечаток офсетным способом11. n полигр. тех. несовпадение, смещение, сдвиг12. a смещённый, несоосный13. a расположенный под углом14. a полигр. офсетный15. v возмещать, компенсировать16. v сводить баланс; выравнивать17. v полигр. печатать офсетным способом18. v полигр. делать оттиски офсетным способом19. v полигр. горн. отступать в сторону; уширять штрекСинонимический ряд:1. balance (verb) atone for; balance; compensate; compensate for; counter; counteract; counterbalance; counterpoise; countervail; equalise; equalize; make up; make up for; neutralise; neutralize; outweigh; redeem2. compensated (verb) atoned for; balanced; compensated; counterbalanced; counterpoised; made up; outweighed; redeemed; set off -
11 offset
1) офсет
2) дезаксиальный
3) корне-отпрысковый
4) корнеотпрысковый
5) навал лопаток
6) офсетный
7) ответвление
8) отклонение
9) сдвиг
10) отверстие
11) отвод
12) <comput.> смещение
– deep-etched offset
– letterpress offset
– offset carrier
– offset cylinder
– offset duplicator
– offset electrode
– offset harrow
– offset holder
– offset lithography
– offset method
– offset paper
– offset plate
– offset press
– offset printing
– tool offset
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12 mask
1. ім.1) фотошаблон; шаблон; (вільна) маска; трафарет2) маска, маскуючий шар2. дієсл. маскувати - artwork mask
- base-region mask
- base mask
- base-resistor mask
- bimetal mask
- blocking mask
- chrome mask
- collector mask
- composite mask
- contact-area mask
- contact mask
- contact-print additional mask
- custom mask
- deep UV mask
- delineation mask
- deposition mask
- diffusion mask
- doping mask
- dry film solder mask
- E-beam mask
- E-chrome mask
- electron-beam generated mask
- emitter mask
- emulsion mask
- etch ing mask
- etch mask
- etch-resistantmask
- etch-resistmask
- evaporation mask
- exposure mask
- fault injection mask
- faultless mask
- field-oxidemask
- fieldmask
- fine-line mask
- gold mask
- grid mask
- hard-surface mask
- high-contrast X-ray mask
- high-flatness mask
- high-transmission X-ray mask
- IC mask
- in situ mask
- insulator mask
- interconnection mask
- ion-beam stencil mask
- ion-implantation mask
- iron-oxide mask
- isolation mask
- layered mask
- lithographic mask
- master mask
- metal mask
- metal etched mask
- metallization etching mask
- metal-on-glass mask
- metal-on-polymer mask
- moving mask
- multi-pinhole mask
- native охide mask
- negative mask
- nonerodible mask
- offset mask
- optical mask
- optical gate mask
- overlaid mask
- oxidation mask
- oxygen-impermeable mask
- pattern mask
- pattern transfer mask
- photolithographic mask
- photoresist mask
- plating mask
- production mask
- programmingmask
- programmask
- projection mask
- p-well mask
- quartz mask
- refractory mask
- resistor-body mask
- reticle mask
- self-aligned mask
- sputter mask
- stencil mask
- step-and-repeat mask
- thick-film screen mask
- thin-film mask
- trench mask
- vacuum-deposition mask
- work mask
- X-ray lithography mask
- X-ray mask
- 1x mask
- 1:1 mask -
13 photolithography
фотолітографія, оптична літографія (див. т-ж lithography) - deep-UV contact photolithography
- in-line photolithography
- relaxed registration photolithography
- 1:1 projection photolithographyEnglish-Ukrainian dictionary of microelectronics > photolithography
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14 system
1) система 2) устаткування; пристрій - assembly system
- autolayout system
- automated accounting system
- automated photomasking system
- automated photomask system
- automatic data асquisition system
- automatic data analysis system
- automatic data digitizing system
- base-metal system
- batch system
- bi-etching system
- bubble test system
- building-block layout system
- CAD system
- cassette-to-cassette system
- chopping system
- closed-tube oxidation-diffusion system
- code-translation data system
- command retrieval system
- computer-aided design system
- conductor paste system
- conductor system
- continuous stage motion e-beam system
- Czochralski production system
- damage tolerant system
- data асquisition and display system
- data analysis and reduction system
- data collection and processing system
- decision data support system
- decision-support system
- deep-UV projection system
- design automation system
- die attach system
- dielectric paste system
- dielectric system
- diffusion system
- direct step-on-wafer system
- direct-write e-beam system
- dopant system
- double-chamber vacuum-deposition system
- double-track system
- electron-beam mask system
- electron-beam projection system
- encapsulation welding system
- epitaxial growth system
- epitaxial system
- epoxy dispensing system
- etchant regeneration system
- etching system
- etch/strip system
- evaporation system
- exposure system
- fabrication system
- fault-tolerant system
- flex-fab system
- flexible machining system
- fly’s eye system
- gate-array layout system
- Gaussian-beam e-beam system
- Genesil system
- graphite furnace atomic absorption system
- hierarchically CAD system
- hierarchical-oriented CAD system
- high-resolution electron-beam system
- IC system
- image projection system
- indexing system
- ink system
- in-line system
- integrated programmable gate-array system
- ion-beam system
- ion-beam sputtering system
- isoplanar system
- laminar-flow system
- lead-forming system
- lead-frame assembly system
- lithographic system
- lithography system
- logic analysis system
- logic synthesis system
- mask alignment and exposure system
- metal system
- metallization system
- Micralign system
- micro-Optical Electro-Mechanical systems MOEMS
- micro-Optical Electro-Mechanical systems
- micropower system
- multichip system
- multicircuit microprocessor system
- multidomain system
- multiple-tens camera system
- negative-resist system
- non-real-time data automation system
- one-step t-fault diagnosable system
- one-to-one scanning system
- on-line circuit analysis system
- on-line circuit design system
- open-ended CAD system
- open-tube system
- palladium-silver thick-film conductor system
- palladium-silver conductor system
- paste system
- photomasking system
- photorepeating system
- pick-and-place system
- planar plasma system
- plenum flush system
- portable CAD system
- positive resist system
- preinsertion processing system
- printed-circuit board assembly system
- printed-circuit assembly system
- probing system
- processing system
- production system
- projection printing system
- projection system
- quick vacuum system
- reduced system
- reducing electron -beam projection system
- reducing electron projection system
- reflow soldering system
- rinser/dryer system
- screen printing system
- scribing system
- self-documenting CAD system
- self-repair system
- sequentially t-fault diagnosable system
- shaped-beam e-beam system
- single-chip system
- SMIF system
- software test-bed system
- solder evacuation system
- solder fusion system
- split-chamber vacuum coating system
- split-field alignment system
- step-and-repeat system
- step-and-repeat photomask system
- step-on-wafer projection system
- surface measurement system
- terminal point detection system
- thermal mapping system
- thick-film resistor system
- transfer system
- transport system
- tri-metal system
- trimming system
- turnkey CAD system
- UV exposure system
- vacuum-deposition system
- vacuum purge system
- variable-shaped electron-beam exposure system
- vector-scan e-beam system
- wafer gaging system
- wafer routing system
- wafer-scale system
- wafer-stepper projection system
- wave solder system
- wiring system
- X-ray exposure system
См. также в других словарях:
deep-ultraviolet lithography — tolimojo ultravioleto litografija statusas T sritis radioelektronika atitikmenys: angl. deep ultraviolet lithography vok. Lithografie mit extrem kurzwelligem Ultraviolettlicht, f rus. литография с источником дальнего ультрафиолетового излучения,… … Radioelektronikos terminų žodynas
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as … Wikipedia
X-ray lithography — is a next generation lithography that has been developed for the semiconductor industryref|vlad. Batches of microprocessors have already been produced. The short wavelengths of 0.8 nm X rays overcome diffraction limits in the resolution of… … Wikipedia
Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… … Wikipedia
Screenless lithography — A technique dating to 1855, when the French chemist and civil engineer Alphonse Louis Poitevin discovered the light–sensitive properties of bichromated gelatin and invented both the photolithography and collotype processes. After the invention of … Wikipedia
Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia
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